What is the difference between vacuum evaporation coating, magnetron sputtering coating, and vacuum ion coating?
What is the difference between vacuum evaporation coating, magnetron sputtering coating, and vacuum ion coating?
The main difference is the principle.
1. The working principle of vacuum evaporation coating is to place the film material in the vacuum coating chamber, and heat it with the evaporation source to evaporate it. When the mean free path of the evaporated molecules is greater than the linear size of the vacuum coating chamber, the atoms, and molecules of the vapor escape from the surface of the evaporation source. After being released, it is rarely impacted and hindered by other molecules or atoms, and can directly reach the surface of the substrate to be plated. Due to the low temperature of the substrate, it will condense on it to form a film.
2. Magnetron sputtering coating means that electrons collide with argon atoms in the process of flying to the substrate under the action of the electric field E so that they ionize to generate Ar positive ions and new electrons; the new electrons fly to the substrate, Ar positive ions are accelerated to the cathode target under the action of the electric field, and bombard the target surface with high energy, so that the target sputters. In sputtered particles, neutral target atoms or molecules are deposited on the substrate to form a thin film.
3. The working principle of vacuum ion coating is: that the evaporation source is connected to the anode, and the workpiece is connected to the cathode. Part of the argon gas in the vacuum cover is ionized under the action of the electric field, forming a plasma dark area around the cathode workpiece. The positively charged argon ions are attracted by the negative high voltage of the cathode, and bombard the surface of the workpiece violently, causing the particles and dirt on the surface of the workpiece to be splashed and thrown out, so that the surface of the workpiece to be plated is fully cleaned. Then, the AC power supply of the evaporation source is turned on, and the evaporation material particles are melted and evaporated, enter the glow discharge area, and are ionized. The positively charged evaporating material ions, attracted by the cathode, rush to the workpiece together with the argon ions. When the evaporating material ions plated on the surface of the workpiece exceed the number of sputtered ions, they gradually accumulate to form a layer firmly adhered to the workpiece. The coating on the workpiece surface.
