Electron Beam Gun Crucible Liner

Product name: Electron beam gun crucible liner

There is an automatic or manual shutter above the electron beam gun crucible liner to block the flow of evaporated molecules. The thickness of the film to be deposited is precisely controlled through the switch of the shutter. Usually, the shutter must be closed before the material to be plated is formally evaporated. It is completely heated and melted to the evaporation state before opening to ensure the quality of the evaporated film.

Compared with the traditional thermal resistance heating method, the electron gun evaporation method has higher thermal conversion efficiency and less energy, and the selection of evaporation materials is less restricted. In terms of pure element evaporation, resistive evaporation is limited by the heating temperature, and most of them are only engaged in a few thin films such as aluminum, chromium, gold, and silver. Electron beam evaporation can deposit high melting point materials such as tungsten, molybdenum, etc. Metals and highly reactive metals such as titanium and niobium, and even magnetic materials such as iron, cobalt, nickel, and other metals that are difficult to prepare by sputtering technology, can also be vapor-deposited with good quality films.

In order to take into account the purity of the film, the evaporation of pure elements usually adopts the deposition conditions of high vacuum degree and high evaporation rate.

Compound materials such as oxides, sulfides, nitrides, and fluorides can be evaporated by electron guns. Some materials will dissociate due to high heat during the evaporation process by electron beam heating. This is also the main method of evaporation. The disadvantage is usually solved by reactive evaporation. In order to ensure that the lack of film formation can be supplemented by the high temperature of the substrate during the reaction process, the coating rate must be appropriately reduced in operation.

Part of the insulating compounds will have the problem of negative charge accumulation when they are continuously bombarded by electrons so that the subsequent electrons are repelled by the negative potential and cannot completely reach the surface of the material to be plated. Helps the accumulated negative charge to be smoothly exported, which is quite effective in small electron beam gun crucible liner, but it is difficult to avoid some instability of the coating rate for large electron beam gun crucible liner.

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