Molybdenum Sputtering Target For Evaporation

The working principle of magnetic control molybdenum sputtering target for evaporation is that under the action of electron Efang E, it collides with the argon atoms during the flying substrate. The AR ion accelerates to the cathode target under the influence of the electric field, and the surface of the molybdenum sputtering target for evaporation is bombarded with high energy so that the target is sputtering.

The molybdenum sputtering targets for evaporation have a variety of excellent properties such as high strength, high-temperature resistance, abrasion resistance, and corrosion resistance, and its purity is 99.95%, density is 10.2 grams/cubic centimeter, melting point is 2610 ° C, and the boiling point is 5560 ° C. According to the shape of the molybdenum target, the rectangular magnetic sputtering target, the round magnetic sputtering molybdenum target, and the cylindrical tube magnetic sputtering molybdenum target. molybdenum sputtering targets for evaporation are mainly used in the electronics and information industries, such as integrated circuits, information storage, LCD, laser memory, electronic control devices, etc. In addition, the molybdenum sputtering target for evaporation also be applied to the field of glass coating, and it also is used in industries such as wear-resistant materials, high-temperature, and corrosion-resistance, and high-end decorative supplies.

Molybdenum targets are widely used in the production of thin films for evaporation coating. Here are the characteristics of molybdenum targets for evaporative coating:

1. High Melting Point: Molybdenum targets have a high melting point of 2623°C, which makes them ideal for use in high-temperature applications such as evaporative coating.

2. High Purity: Molybdenum targets are available in high purity grades that are suitable for use in electronic applications that require high-quality thin films.

3. Good Thermal Conductivity: Molybdenum has an excellent thermal conductivity that makes it an excellent material for heat dissipation in evaporative coating processes.

4. Chemical Stability: Molybdenum targets are chemically stable and resistant to corrosion, which makes them ideal for use in harsh environments.

5. Low Sputtering Rate: Molybdenum targets have a low sputtering rate, which means that they have a long life span. This reduces maintenance costs and downtime in production processes.

6. Low Gas Emission: Molybdenum targets have a low gas emission rate, which makes them ideal for use in vacuum environments such as evaporative coating chambers.

7. Customization: Molybdenum targets can be customized to meet specific requirements for size, shape, and purity. This provides flexibility in the production process and allows for more precise control over the thin film layer thickness.

Overall, molybdenum targets are an excellent choice for use in evaporative coating processes due to their high melting point, high purity, good thermal conductivity, chemical stability, low sputtering rate, low gas emission, and customization options.

Hot Tags: molybdenum sputtering target for evaporation, China, suppliers, manufacturers, factory, buy, price, discount, in stock, made in China