Molybdenum Sputtering Target

1.  Molybdenum sputtering target, Based on the high melting point, high electrical conductivity, low specific impedance, good corrosion resistance, and good environmental performance of molybdenum, molybdenum sputtering targets can form thin films on various substrates.

2. What is a sputtering target?

A sputtering target is a material for making thin films by sputter deposition or thin-film deposition techniques. During this process, the sputtering target material starts out as a solid and is broken down by gas ions into tiny particles that form a spray and coat another material, the so-called substrate. Sputter deposition is commonly used to make semiconductors and computer chips. Therefore, most sputtering target materials are metallic elements or alloys, although there are also ceramic targets that can produce hardened thin coatings for various tools.

3. Requirements of  molybdenum sputtering targets:

3.1 High purity.

3.2 Crystallographic orientation: Since the atoms of the target material are easily sputtered in the direction of the ost densely arranged atomic hexagonal during sputtering,  to achieve the highest sputtering rate, the sputtering rate is improved by changing the crystal structure of the target material. Therefore, obtaining a target structure with a certain crystallographic orientation is very important for the sputtering process of the thin film.

3.3 Density：relative density should be above 98%.

3.4 Binding of target and chassis： Generally, the molybdenum sputter target must be connected to the chassis of oxygen-free copper (or other materials such as aluminum) before sputtering, so that the thermal conductivity of the target and the chassis is good during the sputtering process. After binding, the ultrasonic inspection must be carried out to ensure that the unbonded area of the two is less than 2%,  to meet the requirements of high-power sputtering without falling off.

4. Expand knowledge of molybdenum sputtering targets:  The requirements of sputtering targets are higher than those of the traditional material industry, such as size, flatness, purity, impurity content, density, N/O/C/S, grain size and defect control; higher requirements or special requirements. Requirements include: surface roughness, resistance value, grain size uniformity, composition and structure uniformity, foreign matter (oxide) content and size, magnetic permeability, ultra-high density and ultra-fine grains, etc. Magnetron sputtering coating is a new type of physical vapor coating method, which uses an electron gun system to emit and focus electrons on the material to be plated, so that the sputtered atoms follow the momentum conversion principle and separate from the material with higher kinetic energy. Fly to the substrate to deposit a film. This plated material is called a sputtering target. Sputtering targets include metals, alloys, ceramic compounds, etc.

5. Classifications of molybdenum sputtering targets:

● According to the application field, it is divided into microelectronic target material, magnetic recording target material, optical disc target material, precious metal target material, thin film resistance target material, conductive film target material, surface modification target material, mask layer target material, decorative layer target material, Electrode targets, package targets, other targets.

● According to the composition, it can be divided into metal target, alloy target, ceramic compound target.

● According to different applications, it is divided into semiconductor related ceramic targets, recording medium ceramic targets, display ceramic targets, superconducting ceramic targets and giant magnetoresistance ceramic targets, etc. 

● According to the shape, it can be divided into square target, round target, special-shaped target. The design of sputtering systems, ie machines that carry out the thin film deposition process, has become more varied and specific. Correspondingly, the shape and structure of the target also began to diversify. The shape of the sputtering target is usually rectangular or circular, and Magotan can process various types of sputtering targets according to your requirements. Molybdenum sputtering targets produced by Magotan are high technical, high purity and high-relative density, and the grains are fine and uniform.

6.  When working with Magotan you will have competitive pricing, fair terms, and adequate, detailed settlements that leave nothing to question. Magotan has a professional team from processing to packaging and delivering. We hope to be your reliable long-term partner, providing you with competitive prices and unmatched quality, helpful service at any step you take.

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