Tantalum Sputtering Target

1. Product name: Tantalum sputtering target

Using a physical vapor deposition (PVD) process, a tantalum sputtering target is "sputtered" onto a semiconductor substrate to form a thin-film diffusion barrier to protect the copper interconnects. Tantalum sputtering targets are also used for other products, including magnetic storage media, inkjet printer heads, and flat panel displays.

2. Tantalum sputtering targets are divided into three grades according to their purity: 3N5 (99.95%), 4N (99.99%), and 4N5 (99.995%).

3. Tantalum sputtering target applications:

• thin film coating

• CD-ROM

• decoration

• flat panel display

• functional coating

• optical information storage space industries

• glass coating industries such as automotive glass and architectural glass

• optical communication

4. Our company and factory:

Baoji Magotan Nonferrous Metals Co., Ltd has many years of experience in the production, sales, and R&D of tantalum sputtering targets. The surface of our tantalum sputtering target is clean and bright, free of finger marks, oil stains, and rust, and no particle attachments and other contamination, smooth and flat, with no pits, bumps, scratches, or cracks.

5. Package:

1) Tantalum sputtering targets are cleaned, vacuum-dried, and vacuum-packed in thousands of clean rooms. Each piece is individually vacuum-packed. The vacuum bag is sealed flat, and there is no vacuum leakage.

2) The outer packaging adopts paper, wood, or special box packaging. There are anti-collision measures in the box. The quality certificate is packed in a plastic bag and pasted into the box.

3) Packaged products should be kept in a clean environment.

6. High-performance tantalum sputtering materials can be used for thin-film coating, CD-ROM, decoration, flat panel display, functional coating, and other optical information storage space industries, glass coating industries such as automotive glass, architectural glass, optical communications, etc.

6.1 Capacitors

About half of the tantalum consumed each year is used in the electronics industry, mainly as powder and wire for capacitors. Tantalum capacitors are favored in space-sensitive high-end applications in telecommunications, data storage, and implantable medical devices.

6.2 Semiconductor

Using a physical vapor deposition (PVD) process, a tantalum sputtering target is "sputtered" onto a semiconductor substrate to form a thin-film diffusion barrier to protect the copper interconnects. Tantalum sputtering targets are also used in a variety of other products, including magnetic storage media, inkjet printer heads, and flat panel displays.

6.3 Engine turbine blades

The high melting point and corrosion resistance of this metal make it ideal for alloying applications. Tantalum is used in nickel-based superalloys, mainly in turbine blades for aircraft engines and land-based gas turbines.

6.4 chemical processing equipment

Tantalum's extremely high corrosion and high-temperature properties make this metal an ideal construction material for vessels, pipes, valves, and heat exchanger linings in the chemical and pharmaceutical industries.

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