tantalum ion implantation parts
1.high density
2.high purity
3.and good dimensional accuracy
Product Introduction
Tantalum ion implantation parts description
Tantalum ion implantation parts are mainly used in semiconductor and photovoltaic fields. The semiconductor field belongs to wafer manufacturing equipment, which is mainly used in the injection (doping) process of wafer manufacturing process. The main way and purpose is to make the pure silicon with poor conductivity into a useful semiconductor by adding a small amount of impurities. Through the acceleration and guidance of the ion implantation machine, the required doped ions are incident into the material in the form of ion beam, and a series of physical and chemical reactions occur to optimize the surface properties of the material.
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What is ion implantation?
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