Zirconium Sputtering Target

Zirconium sputtering target has the same properties as its raw material.  It has a density of 6.49g/cc, a melting point of 1852 ° C, and vapor pressure of 10-4 torr at 1987 ° C.  It is a shiny, off-white, strong transition metal very similar to hafnium and, to a lesser extent, titanium.  Zirconium is mainly used as a refractory and opacification agent, but a small amount of zirconium is used as an alloying agent because of its strong corrosion resistance.  Zirconium sputtering targets are widely used in decorative coatings, semiconductors, and optical coatings. 

• Material preparation 

• electron beam melting

• chemical analysis

• forging 

• rolling

• annealing

• metallographic inspection

• machining

• size inspection

• cleaning

• final inspection

• packaging 

Widely used in film deposition, fuel cells, decoration, semiconductor, display, LED and photovoltaic devices, functional coating and other optical information storage space industries, automotive glass and building glass and other glass coating industries, optical communication, and other fields. 

Magotan provides a variety of purity, specifications of the high-purity metal sputtering target, alloy sputtering target, non-metal sputtering target, and ceramic sputtering target, but also provides high-purity metal particles, high entropy alloy, powder, wire, rod wire, sheet, and other morphological materials. 

As long as you provide detailed target information, such as purity, size, tolerance requirements, and technical requirements, we will quote for you and provide the shortly delivery time. 

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